Title:
MASK PROTECTOR, METHOD FOR PRODUCING THE SAME, MASK AND EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP2002049145
Kind Code:
A
Abstract:
To provide a mask protector which suppresses the deflection of a pellicle and can prevent the lowering of optical characteristics caused by the deflection of the pellicle and to provide a method for producing the mask protector.
Films TSF and CSF having such a stress as to correct the deflection of a pellicle PE are formed on the surface of the pellicle PE.
Inventors:
YAMATO SOICHI
Application Number:
JP2000232333A
Publication Date:
February 15, 2002
Filing Date:
July 31, 2000
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F1/46; G03F1/62; H01L21/027; (IPC1-7): G03F1/14; H01L21/027
Attorney, Agent or Firm:
Masatake Shiga (5 outside)
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