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Title:
SUBSTRATE MOVING APPARATUS
Document Type and Number:
Japanese Patent JP2008091785
Kind Code:
A
Abstract:

To receive reflected laser light by a plane mirror with reliability after a rotational position of a substrate is adjusted.

A measuring section 5 of a pattern drawing apparatus comprises: a plane mirror 51 mounted on a side surface of a stage 3; a laser light source 52; a first linear interference block 551 and a first receiver 552; a second linear interference block 561 and a second receiver 562; and a mirror rotation mechanism 57 rotating the plane mirror 51 with respect to the stage 3 with a mirror rotation axis 571 perpendicular to the stage 3 as a center. In the pattern drawing apparatus, the plane mirror 51 rotates in the opposite direction to a rotating direction of the stage 3 in pre-alignment of a substrate, so that a reflection surface of the plane mirror 51 is set perpendicular to the main scanning direction. This allows the reflected laser light by the plane mirror 51 to be received by the first receiver 552 and the second receiver 562 with reliability after adjustment of the rotational position of the substrate.


Inventors:
TANIGUCHI SHINYA
WADA YASUYUKI
HAYASHI HIDEKI
KOYAGI YASUYUKI
Application Number:
JP2006273234A
Publication Date:
April 17, 2008
Filing Date:
October 04, 2006
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG
International Classes:
H01L21/027; G01B11/00; G01B11/26; H01L21/68
Domestic Patent References:
JPH01202833A1989-08-15
JPH0310105A1991-01-17
JPH1074687A1998-03-17
JPH10332327A1998-12-18
JPH1197512A1999-04-09
JP2005191150A2005-07-14
JPS62200726A1987-09-04
Attorney, Agent or Firm:
Masahiro Matsusaka