Title:
基板処理装置、基板処理方法及び記憶媒体
Document Type and Number:
Japanese Patent JP6468213
Kind Code:
B2
Abstract:
According to the present invention, when atmosphere of a plurality of substrate processing units in which the atmosphere including attachment components is generated is discharged through a common exhaust path, defects of an individual exhaust path of each substrate processing unit can be certainly detected. When a plurality of resist coating units (10A-10D) for coating a wafer (W) with resist are exhausted through a common exhaust path (60) for discharging air by an exhaust manly strength facility, exhaust pressure of individual exhaust pipes (50A-50D) of each of the resist coating units (10A-10D) and exhaust pressure of the common exhaust path (60) are measured, and allowed pressure ranges corresponding to the measured values are compared. Thus, defects such as clogging or the like of an attachment material in the individual exhaust pipes (50A-50D) can be certainly detected.
Inventors:
Masayuki Kajiwara
Ryoji Ando
Yoichi Masaki
Hirokazu Inada
Ryoji Ando
Yoichi Masaki
Hirokazu Inada
Application Number:
JP2016030347A
Publication Date:
February 13, 2019
Filing Date:
February 19, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; G03F7/16; H01L21/02
Domestic Patent References:
| JP2000260680A | ||||
| JP2006215470A | ||||
| JP10312952A | ||||
| JP2007305624A | ||||
| JP10030973A |
Foreign References:
| US20150129044 |
Attorney, Agent or Firm:
Patent Corporation Yayoi Patent Office
Toshio Inoue
Tomoaki Miida
Toshio Inoue
Tomoaki Miida