Title:
SUBSTRATE TREATING APPARATUS
Document Type and Number:
Japanese Patent JP3462325
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate treating apparatus whereby a replenished liquid is diffused enough into a treating liq. with a little liq.'s temp drop, without boiling of the replenished liquid.
SOLUTION: Pure water PW is drainwater from pure water jet holes Ha of a pure water injection nozzle 10a to the surface of a phosphate soln. PA near an overflowing part 20a at the top end of the inner side face 1a of an inner tank 1 disposed beneath the holes Ha, arrives at a gutter of an outer tank 2 during mixing with the soln. PA and flows into a reservoir 30d of the tank 2. Since the water PW never arrives at the interior of the soln. PA in the tank 1, no boiling of the water occurs and when the soln. PA overflows from the tank 1 to the tank 2, both the liq. PA and water PW are stirred to diffuse the water enough in the soln. PA. Since no water evaporates directly from the surface of the soln. PA, its temp. drop is little.
Inventors:
Nobutoshi Ogami
Hisao Nishizawa
Hisao Nishizawa
Application Number:
JP33342595A
Publication Date:
November 05, 2003
Filing Date:
December 21, 1995
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B08B3/04; H01L21/00; H01L21/304; H01L21/306; (IPC1-7): H01L21/306; H01L21/304
Domestic Patent References:
| JP758078A | ||||
| JP6310487A |
Attorney, Agent or Firm:
Shigeaki Yoshida (2 outside)