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Title:
SURFACE TREATMENT AND APPARATUS THEREFOR
Document Type and Number:
Japanese Patent JP3799819
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a method capable of generating a stable and uniform plasma discharge in the surface treatment of an indirect discharge system by the plasma discharge under atmospheric pressure to form excitation active species, rapidly transporting the thus formed excitation active species from a discharge region and efficiently treating the surface of the work even in a remote position, and an apparatus therefor.
SOLUTION: In the process of subjecting the surface treatment of the work 18 by generating the gas discharge in a prescribed gas under the atmospheric pressure or a pressure near the same to form the excitation active species, feeding the treating gas contg. the excitation active species near to the surface of the work and exposing the surface to the excitation active species, the flow velocity of the treating gas fed from the discharge region is accelerated by a pressure difference between the inside of a gas flow passage 12 and the atmosphere near the work 18 or providing the flow passage of the treating gas with a throttling means. Further, the flow passage of the treating gas is provided with a heating means, such as electric heater to maintain the high temp. of the treating gas sent near to the surface of the work 18.


Inventors:
Takeshi Miyashita
Yasuhiko Asano
Application Number:
JP15370998A
Publication Date:
July 19, 2006
Filing Date:
May 20, 1998
Export Citation:
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Assignee:
Seiko Epson Corporation
International Classes:
C23C26/00; H05H1/24; B01J19/08; C23C16/44; C23C16/455; C23F4/00; H01L21/205; H01L21/302; H01L21/3065; H05H1/46; (IPC1-7): C23C26/00; B01J19/08; C23C16/44; C23F4/00; H01L21/205; H01L21/3065; H05H1/24; H05H1/46
Domestic Patent References:
JP9027482A
JP7240396A
JP10088372A
Attorney, Agent or Firm:
Akihiko Umeda



 
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