Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SYSTEM FOR PRODUCING SEMICONDUCTOR
Document Type and Number:
Japanese Patent JP2002217093
Kind Code:
A
Abstract:

To provide a system for producing semiconductor in which total installation work including cables is reduced by keeping noise generation incident to increase in the lamp throw-in power at a conventional level or below and limiting the installation space within a conventional level, and energy saving is realized by enhancing the efficiency of a cooler and reducing power being used for cooling.

The system for producing a semiconductor comprises a light source lamp 7 and a lighting unit thereof wherein the light source lamp 7 is connected directly with the lighting unit through a metal 20 for connecting the light source lamp 7 directly with a starter section for lighting the light source lamp 7.


Inventors:
NAKAMURA HAJIME
Application Number:
JP2001014209A
Publication Date:
August 02, 2002
Filing Date:
January 23, 2001
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
CANON KK
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
JPS575046A1982-01-11
JPS62239533A1987-10-20
JPS6327015A1988-02-04
JPS6475070A1989-03-20
JPH0228655A1990-01-30
JPH06250060A1994-09-09
JPH07176475A1995-07-14
JPH07201712A1995-08-04
JPH08250071A1996-09-27
JPH10135123A1998-05-22
JPH10200698A1998-07-31
JPH11111604A1999-04-23
JPH11162839A1999-06-18
JPH11258815A1999-09-24
JPH11283893A1999-10-15
JPH11338163A1999-12-10
JP2000181075A2000-06-30
JP2000260698A2000-09-22
JPH0670229U1994-09-30
Foreign References:
US6333602B12001-12-25
Attorney, Agent or Firm:
Tetsuya Ito



 
Previous Patent: METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

Next Patent: MASK FOR ELECTRON BEAM EXPOSURE AND ITS MANUFACTURING METHOD