Title:
SYSTEM FOR SUPPLYING CLEANING LIQUID
Document Type and Number:
Japanese Patent JP3683485
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a cleaning liquid supplying system for suitably exhausting a cleaning liquid while using it carefully.
SOLUTION: The cleaning liquid used in a first cleaning station is sent to a spent liquid tank 2 through a sending pipe 12. The spent cleaning liquid in the tank 2 is sent to a second cleaning station through a supply pipe 21 and used for cleaning the edge part of a substrate or the inside of a cup. The cleaning liquid used in the second cleaning station is sent to another spent liquid tank 3 through a return pipe 30 and a pipe 32 branched from the pipe 30 and recovered.
Inventors:
Tadashi Shimai
Atsushi Koshiyama
Yasumitsu Taira
Atsushi Koshiyama
Yasumitsu Taira
Application Number:
JP2000268450A
Publication Date:
August 17, 2005
Filing Date:
September 05, 2000
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
B08B3/04; B08B3/08; H01L21/304; (IPC1-7): B08B3/04; B08B3/08; H01L21/304
Domestic Patent References:
| JP9001035A | ||||
| JP4177726A | ||||
| JP10022204A | ||||
| JP9308868A |
Attorney, Agent or Firm:
Yu Koyama