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Patent Searching and Data


Title:
TEM試料作成方法
Document Type and Number:
Japanese Patent JP4392272
Kind Code:
B2
Abstract:

To provide a technique capable of transferring surely a TEM sample to a fixing block by a probe of a manipulator, while observation-confirming a cut-separated condition by an SIM image, in a method for cutting out and preparing the TEM sample from a sample main body by an FIB device.

This method includes a step for preparing a sheetlike cut-out piece 2 and a support part 6 for supporting the cut-out piece in the large sample main body 1 by FIB etching, a step for separating the cut-out piece 2 from the sample main body by the FIB etching, and a step for applying force onto the cut-out piece 2 from the probe by operating the micro-manipulator, while observing the SIM image, to confirm the separation of the cut-out piece from a sample.

COPYRIGHT: (C)2005,JPO&NCIPI


Inventors:
Munekane
Application Number:
JP2004063849A
Publication Date:
December 24, 2009
Filing Date:
March 08, 2004
Export Citation:
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Assignee:
SII Nanotechnology Co., Ltd.
International Classes:
G01N1/28; G01N1/32; H01J37/20; H01J37/317
Domestic Patent References:
JP2001083055A
JP2774884B2
JP2004361139A
JP2002333387A
JP2003065905A
JP2002187099A
JP2003016988A
JP2003013226A
Foreign References:
WO1999005506A1
Attorney, Agent or Firm:
Yoshiharu Matsushita