Title:
TANTALUM AND NIOBIUM COMPOUND AND THEIR USE FOR CHEMICAL VAPOR DEPOSITION (CVD) PROCESS
Document Type and Number:
Japanese Patent JP2007031431
Kind Code:
A
Abstract:
To provide a new precursor compound for forming tantalum and niobium-containing coating, being free from defect which a compound produced by conventional technique has or at least bringing about clear improvement.
The compound is represented by formula (I) [wherein M is Ta or Nb; R1 and R2 are each a (cyclo)alkyl group, an aryl group, a 1-, 2- or 3-alkenyl, a triorganosilyl group or an amino group; R3 is a (cyclo)alkyl group, an aryl group or SiR3 or NR2; R4 is a halogen, NH-R5, O-R6, -SiR3, BH4, an allyl group or an indenyl group, a benzyl group, a cyclopentadienyl group or -NR-NR'R" (hydrazide(-1)) or CH2SiMe3, a pseudo-halide or a silylamide; R7 and R8 are each hydrogen, a (cyclo)alkyl group or an aryl group].
Inventors:
REUTER KNUD
SUNDERMEYER JOERG
MERKOULOV ALEXEI
STOLZ WOLFGANG
VOLZ KERSTIN
POKOJ MICHAEL
OCHS THOMAS
SUNDERMEYER JOERG
MERKOULOV ALEXEI
STOLZ WOLFGANG
VOLZ KERSTIN
POKOJ MICHAEL
OCHS THOMAS
Application Number:
JP2006195761A
Publication Date:
February 08, 2007
Filing Date:
July 18, 2006
Export Citation:
Assignee:
HC STARCK GMBH
International Classes:
C07F9/00; C23C16/34
Attorney, Agent or Firm:
Aoyama Aoi
Yasuo Shibata
Kenichi Morizumi
Yasuo Shibata
Kenichi Morizumi
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