PURPOSE: To form spatter films of various composition ratio easily by placing spatter materials of more than two kinds in a target electrode of a spattering device of planer magnetron system and installing a specified target electrode.
CONSTITUTION: Different spatter materials A, B are provided concentrically on a target plate, and a permanent magnet 4 for generating main magnetic flux and a peripheral soft magnetic material 3 are attached. Further, a magnetic pole 13 for controlling the shape of distribution of magnetic line of force and a coil 14 for exciting are provided to control the shape of magnetic line of force. Plasma domains 16a, 16b are generated by forming flat parts of two kinds of magnetic line of force 15a, 15b in a hollow space of the side of the target plate 12 that faces a sample base plate. Erosion domains in the target plate are in the domain of spatter material A and in the domain of spatter material B. Spatter films of various composition ratio can be formed easily by sending out spatter materials A and B alternately.
NAKAGAWA YOSHIO
ABE KATSUO
KOBAYASHI SHIGERU
KAMEI TSUNEAKI
