Title:
【発明の名称】半導体装置の製造方法
Document Type and Number:
Japanese Patent JP3164815
Kind Code:
B2
Abstract:
PURPOSE:To greatly improve the contrast of projected images and to improve the transfer accuracy of patterns by dividing the light generated from a light source to two beams of light and changing the optical path length until arriving at a mask, thereby putting the phases of two beams of the light into the antiphases from each other, then synthesizing the two beams of the light. CONSTITUTION:The light generated from the light source 2 is divided to two beams of the light L1,L2 and the optical path lengths until these beams arrive at the mask 14 are changed, by which the phases of the two beams of the light L1, L2 right after the passage through the different points of the mask 14 are made into the antiphases from each other; thereafter, the two beams of the light L1,L2 are synthesized and the surface of a sample 3 to be irradiated is irradiated with this light. The one light L1 transmitted through the prescribed transmission region on the mask 14 and another light L2 transmitted through another transmission region on the mask 14 weaken each other by interfering with each other in the boundary region at the points disposed in proximity on the sample 3 to be irradiated and, therefore, the contrast of the project ed images is greatly improved.
Inventors:
Yoshihiko Okamoto
Application Number:
JP24710090A
Publication Date:
May 14, 2001
Filing Date:
September 19, 1990
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
G03F1/29; G03F1/68; G03F1/76; G03F1/84; G03F7/20; H01L21/027; H01L21/30; H01L21/66; H01L21/8242; H01L27/10; H01L27/108; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Domestic Patent References:
| JP56162747A | ||||
| JP57106128A | ||||
| JP6267547A |
Attorney, Agent or Firm:
Yasuo Sakuta (1 outside)