Title:
X-RAY LITHOGRAPHY AND METHOD OF TREATING SCREEN AND WAFER INSAME SYSTEM
Document Type and Number:
Japanese Patent JPS60160617
Kind Code:
A
Abstract:
The present invention is directed to X-ray lithographic systems, which are characterized by a plurality of work stations, a cartridge in which a wafer and mask are mounted, apparatus for moving the cartridge between the stations, apparatus for moving the cartridge within each station to a kinematic mount, and said kinematic mounts in all of the stations being substantially identical.
Inventors:
KARURO RA FUIANDORA
Application Number:
JP26485A
Publication Date:
August 22, 1985
Filing Date:
January 07, 1985
Export Citation:
Assignee:
PERKIN ELMER CORP
International Classes:
G03F7/20; H01L21/027; (IPC1-7): G03F7/20; H01L21/30
Attorney, Agent or Firm:
Toshio Yano (1 outside)