PURPOSE: To easily and stably form a rugged SnO2 conductive film layer with a reduced loss in the surface reflection of sunbeams on a substrate by growing an SnO2 film on the surface of a transparent glass substrate provided with fine and uniform ruggednesses by sandblast in the vapor phase.
CONSTITUTION: The transparent conductive glass substrate 10 has three layers consisting of a transparent glass substrate 12, an SiO2 film layer 14, and an SnO2 film layer 16. Fine and uniform ruggednesses are formed on one side of the substrate 12 by sandblast, and the film layer 14 is formed on the rugged surface of the substrate 12 by the chemical vapor growth method, etc. Since the film layer 14 is used to prevent the elution of alkali from glass when the substrate 12 is based on the soda lime, the layer 14 is made as thin as possible, and the same ruggednesses as those formed on the substrate 12 are formed on its surface. When the SnO2 film layer 16 is formed on the rugged surface by the chemical vapor growth method, the layer is grown in the form of a hexagonal system, the crystal growth rate is varied by the ruggedness, and a rugged surface effective for light diffusion is formed.
TSUBOI SADAMITSU
TANAKA SHINZOU
YAMAMOTO HIRONOBU
KATOU YUKIHIRO
| JPS60175465A | 1985-09-09 | |||
| JPS61227946A | 1986-10-11 |