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Patent Searching and Data


Title:
VACUUM CHUCK HAND OF SUBSTRATE
Document Type and Number:
Japanese Patent JP2003158169
Kind Code:
A
Abstract:

To hold a substrate having parts to be machined on the opposite sides.

A handle part 2 is fixed to a circular chuck part 1 having a diameter substantially equal to that of a semiconductor wafer being chucked. An annular chuck surface 3 is provided on the outer circumferential part of the chuck part 1 to project from other parts thereof. A plurality of suction holes 4 are made in the chuck surface 3 and vacuum passages 5 are made in the chuck part 1 and the handle part 2. The vacuum passage 5 has one end connected with the suction hole 4 and the other end connected with one port of a solenoid valve 6 which can be operated independently. The solenoid valve 6 has the other port connected with a vacuum chamber 7 which is connected with a vacuum pump 8.


Inventors:
TANAKA ITSUO
KURASHIGE AKIHIRO
Application Number:
JP2001355717A
Publication Date:
May 30, 2003
Filing Date:
November 21, 2001
Export Citation:
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Assignee:
TOMUKO KK
International Classes:
B25J15/06; B65G49/07; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B25J15/06; B65G49/07
Attorney, Agent or Firm:
Yoshihiko Izumi (1 person outside)