VACUUM DEPOSITION METHOD AND METHOD FOR PRODUCING DISPLAY

Title:

VACUUM DEPOSITION METHOD AND METHOD FOR PRODUCING DISPLAY

Document Type and Number:

Japanese Patent JP2000192229

Kind Code:

A

Abstract:

To execute patterning of high precision with less process steps.

This invention is provided with a stage in which plural evaporating sources S1 to S3 are arranged at prescribed intervals oppositely to a glass substrate 1 to be vapor-deposited, a stage in which a mask 2 in which slits 2a have been formed is arranged between the glass substrate 1 and the plural evaporating sources S1 to S3 and a stage in which evaporating materials are emitted from the plural evaporating sources S1 to S3, and each evaporating material is adhered to each different position on the glass substrate 1 via the slits 2a of the mask 2.

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Inventors:

SASAOKA TATSUYA
YAMADA JIRO
HIRANO TAKAYUKI
SEKIYA MITSUNOBU
SANO NAOKI
NAKAYAMA TETSUO
CHIBA YASUHIRO

Application Number:

JP36597598A

Publication Date:

July 11, 2000

Filing Date:

December 24, 1998

Export Citation:

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Assignee:

SONY CORP

International Classes:

C23C14/24; H01L51/50; H05B33/10; H05B33/12; H05B33/14; G09F9/30; (IPC1-7): C23C14/24; G09F9/30; H05B33/10; H05B33/12; H05B33/14

Attorney, Agent or Firm:

Kuninori Funabashi

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