To enhance the characteristics of the film deposition on a synthetic resin-made film formed by consistently depositing a sublimation material to be sublimed on the synthetic resin-made film.

A vacuum film deposition apparatus 1 executes the film deposition by performing the vapor deposition of a sublimation material to be sublimed on at least one side of a synthetic resin-made film 7 in a vacuum vessel under the vacuum atmosphere. The vacuum film deposition chamber 1 comprises a means for executing the sublimation of the sublimation material 9a stored in a material container 9 by electron beams of an electron beam generating means 8, a heated steam supply means 14 for supplying heated steam to a vicinity of the sublimation material 9a, and a microwave generating means 12 for allowing the vapor of the sublimation material 9a to be subjected to the oxidation reaction by applying the microwave to both the sublimation material 9a and the heated steam.

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