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Patent Searching and Data


Title:
スルーチャネル及び真空チャンバを備えた真空ポンプ
Document Type and Number:
Japanese Patent JP7394826
Kind Code:
B2
Abstract:
A vacuum pump 10, a vacuum pumping arrangement and a vacuum chamber are disclosed. The vacuum pump comprises a rotor; a stator; a gas inlet, a gas exhaust and a conduit defining an axial passage 30 extending through the pump from an opening in a base of the pump 11 to an opening axially beyond the pump inlet. The rotor and the stator extend around the conduit 32. A valve plate 12 is configured to obscure the inlet by a controllable amount and to thereby control an inlet conductance of the pump; the plate having a hole in a central portion through which the channel 30 extends. The pump facilitates uniform gas flow around a substrate mount 24, with power cables and other connectors to the holder 24 directed through the pump’s hollow centre 30. A vacuum arrangement with conductance controls on the exhaust is also disclosed.

Inventors:
Bailey Christopher Mark
Stones Ian David
Application Number:
JP2021500574A
Publication Date:
December 08, 2023
Filing Date:
June 27, 2019
Export Citation:
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Assignee:
Edwards Limited
International Classes:
F04D19/04
Domestic Patent References:
JP2012104488A
JP2001351870A
JP11062881A
Foreign References:
US20130153149
Attorney, Agent or Firm:
Shinichiro Tanaka
▲吉▼田 和彦
Hiroyuki Suda
Mitsuru Matsushita
Ichiro Kurasawa
Yasushi Yamamoto