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Patent Searching and Data


Title:
WAFER CARRIER FOR SILICON WAFER CLEANING USE
Document Type and Number:
Japanese Patent JPH04151829
Kind Code:
A
Abstract:

PURPOSE: To prevent contaminants from being transferred without increasing the flow rate of a cleaning liquid by a method wherein a wafer carrier is provided with partition plates for partitioning the carrier into every one sheet of a wafer to house wafers between the partition plates.

CONSTITUTION: A wafer carrier 2 is provided with partition plates 3 for partitioning the carrier 2 into every one sheet of a wafer 1 to house wafers 1 between the partition plates 3 and a cleaning liquid is fed from the lower part of a cleaning tank 4 through a cleaning liquid feed pipe 6. The cleaning liquid passes between the wafers 1 from the side of the bottom of the carrier 2 to flow upward and overflows from the upper part of the tank 4. Thereby, contaminants separated from rears of the wafers in the cleaning liquid can be prevented from being readhered on the surfaces of the wafers without increasing the flow rate of the cleaning liquid.


Inventors:
KOBAYASHI SATOSHI
ANZAI KENJI
Application Number:
JP27531790A
Publication Date:
May 25, 1992
Filing Date:
October 16, 1990
Export Citation:
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Assignee:
NIPPON STEEL CORP
International Classes:
H01L21/304; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Masamitsu Akizawa (1 person outside)