Waste gas purification method and purification equipment

Title:

Waste gas purification method and purification equipment

Document Type and Number:

Japanese Patent JP6297160

Kind Code:

B2

Abstract:

The present invention relates to a purification method and a purification apparatus for off-gas. More specifically, the present invention relates to a purification method and a purification apparatus for off-gas, capable of lowering the concentration of hydrogen chloride and separating high-purity hydrogen from the off-gas, which is discharged after performing a polysilicon deposition process by a chemical vapor deposition reaction.

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Inventors:

Ja Sun Park
Sun A Kim
Won Ik Lee
Gil Ho Kim
Bo Kyun Kim
Gui Leung An

Application Number:

JP2016548044A

Publication Date:

March 20, 2018

Filing Date:

January 19, 2015

Export Citation:

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Assignee:

Hanwa Chemical Corporation

International Classes:

C01B33/107; B01D53/22; B01J31/08; F25J3/02

Domestic Patent References:

JP2001059677A
JP2012532083A
JP7315829A
JP2010248067A
JP2006290674A
JP59033328A

Foreign References:

WO2013163614A1

Attorney, Agent or Firm:

Yasuhiko Murayama
Shinya Mitsuhiro
Tatsuhiko Abe

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