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Patent Searching and Data


Title:
WATER-SOLUBLE PATTERN FORMING MATERIAL
Document Type and Number:
Japanese Patent JPH0934116
Kind Code:
A
Abstract:

To suppress the generation of microbubbles owing to superior defoaming property and to prevent the occurrence of pattern defects in a formed water-soluble film by adding one or more kinds of specified water-soluble compds.

One or more kinds of water-soluble compds. selected from among polyhydric alcohol, monoalkyl ether of polyhydric alcohol, alkylene oxide adduct of monoalkyl ether of polyhydric alcohol, hydroxycarboxylic acid and alkyl ester of hydroxycarboxylic acid are added by 0.00001-30 pts.wt., especially 0.001-10 pts.wt. based on 100 pts.wt. water. In order to improve film forming property, various water-soluble high molecular compds. as well as an acetylene alcohol compd. are preferably added. The high molecular compds. include PVA, its ether deriv., polyacrylic acid and its ester deriv.


Inventors:
HATAKEYAMA JUN
WATANABE SATOSHI
ISHIHARA TOSHINOBU
OKAZAKI SATOSHI
UMEMURA MITSUO
Application Number:
JP20791195A
Publication Date:
February 07, 1997
Filing Date:
July 21, 1995
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/095; G03F7/26; H01L21/027; (IPC1-7): G03F7/095; G03F7/26; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima