Title:
WET TREATING DEVICE
Document Type and Number:
Japanese Patent JP2000288490
Kind Code:
A
Abstract:
To provide a wet treating device of a washing device, or the like, capable of reducing the amount of treating liq. and capable of highly cleaning treatment and also capable of recovering and regenerating the treating liq..
The washing device has an introduction port 23 for introducing hydrogen water, a discharging port 24a for discharging the hydrogen water after use and an opening part opening toward a substrate W. The device is provided with a nozzle for washing a hydrogen water brush for supplying the hydrogen water on the substrate W and the brush rotatively housed inside the nozzle so that a part of the brush is exposed from the open end of the nozzle 4 and can contact the substrate W.
More Like This:
| JP3462325 | SUBSTRATE TREATING APPARATUS |
| WO/2012/065607 | INDUSTRIAL CLEANING SYSTEM |
Inventors:
MIMORI KENICHI
Application Number:
JP9556899A
Publication Date:
October 17, 2000
Filing Date:
April 01, 1999
Export Citation:
Assignee:
FURONTEKKU KK
International Classes:
B08B3/04; B08B3/12; H01L21/304; H01L21/306; B08B1/04; (IPC1-7): B08B3/04; B08B1/04; B08B3/12; H01L21/304; H01L21/306
Attorney, Agent or Firm:
Masatake Shiga (8 outside)