Title:
X-RAY EQUIPMENT, X-RAY ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3187581
Kind Code:
B2
Abstract:
PURPOSE: To remarkably reduce exposure irregularity caused by an X-ray transmission film in a low pressure chamber.
CONSTITUTION: Magnification SR-X-ray 2a magnified by a mirror 3 is introduced in a low pressure chamber through a beryllium thin film 4 as an X-ray transmission film, and a wafer 7 in the low pressure chamber is exposed to the X-ray 2a. The beryllium thin film 4 is so arranged that the change direction of the thickness distribution of the beryllium thin film 4 being the X-ray transmission film coinsides with the change direction of the intensity distribution of the magnification SR-X-ray 2a. By correcting the movement curve of a shutter 5 compensating intensity distribution, exposure irregularity of a wafer 7 caused by film thickness irregularity can be reduced.
Inventors:
Masami Hayashida
Yoshiaki Fukuda
Yutaka Watanabe
Yoshiaki Fukuda
Yutaka Watanabe
Application Number:
JP35960592A
Publication Date:
July 11, 2001
Filing Date:
December 25, 1992
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G21K1/10; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP5919321A | ||||
| JP4288814A | ||||
| JP3212927A | ||||
| JP669102A | ||||
| JP3180021A | ||||
| JP1243519A | ||||
| JP324715A |
Attorney, Agent or Firm:
Yoshiro Sakamoto
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