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Title:
X-RAY SPECTRAL ANALYSIS METHOD
Document Type and Number:
Japanese Patent JPH05296952
Kind Code:
A
Abstract:

PURPOSE: To improve resolution in face direction by reducing bottom effect accompanying irradiation with an electron beam in an X-ray spectral analysis method.

CONSTITUTION: When performing X-ray spectral analysis by irradiating a part 10A to be analyzed of a specimen 10 with an electron beam 12, a cavity 10B is formed in the specimen 10 in adjacent to the part 10A to be analyzed within a region where X rays are generated based on the electron beam 12. The cavity 10B is formed by ion milling, etc. When the electron beam 12 is applied to the part 10A to be analyzed, bottom effect (phenomenon where an X-ray generation region is enlarged due to scattering, etc., of incidence electron) can be reduced drastically as compared with the case where no cavity 10B is provided and performing X-ray spectral analysis with a resolution is face direction of 1.0[μm] or less for the part 10A to be analyzed.


Inventors:
NAITO MASARU
YAMAHA TAKAHISA
Application Number:
JP12816692A
Publication Date:
November 12, 1993
Filing Date:
April 21, 1992
Export Citation:
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Assignee:
YAMAHA CORP
International Classes:
G01N23/225; (IPC1-7): G01N23/225
Attorney, Agent or Firm:
Toshiaki Izawa