Title:
The article containing the subject ground by the cushion for polish, the polish device, the grinding method, and the grinding method concerned
Document Type and Number:
Japanese Patent JP6279309
Kind Code:
B2
Abstract:
A polishing cushion for realizing a plurality of types of polishing with a single polishing apparatus. A polishing cushion according to one embodiment includes a first outer layer facing one out of a polishing member and a support member, a second outer layer facing the other out of the polishing member and the support member, an inner layer positioned between the first outer layer and the second outer layer; and a plurality of spaces formed in the second outer layer which the inner layer is able to enter. The hardness of the inner layer is lower than both of the hardness of the first outer layer and the hardness of the second outer layer.
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Inventors:
Michihiro Yamahara
Application Number:
JP2013263590A
Publication Date:
February 14, 2018
Filing Date:
December 20, 2013
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES COMPANY
International Classes:
B24D7/00; B24B23/02; B24B37/22; B24D11/00
Domestic Patent References:
| JP5212669A | ||||
| JP2009508698A |
Foreign References:
| US20020002027 | ||||
| US6666751 | ||||
| US20100167630 | ||||
| US4287685 |
Attorney, Agent or Firm:
Taro Akazawa
Wakako Nomura
Tsukuda Seigen
Ryohei Yoshino
Wakako Nomura
Tsukuda Seigen
Ryohei Yoshino