Title:
METHOD FOR PROCESSING SURFACE OF QUARTZ GLASS
Document Type and Number:
Japanese Patent JP3117611
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for processing the surface of quartz glass by which rough unevennesses are formed on the surface thereof according to a chemical processing method.
CONSTITUTION: This method for processing the surface of quartz glass is to use a surface processing liquid comprising ≥20wt.% acetic acid, ≥7wt.% ammonium fluoride, ≥4wt.% hydrogen fluoride and >50wt.% and ≤80wt.% water in a method for processing the surface of the quartz glass comprising nonuniformly corroding the surface of the quartz glass with the surface processing liquid and forming unevennesses on the surface thereof.
Inventors:
Katsuhiko Kenmochi
Mamoru Endo
Mamoru Endo
Application Number:
JP33295694A
Publication Date:
December 18, 2000
Filing Date:
December 14, 1994
Export Citation:
Assignee:
Shin-Etsu Quartz Products Co., Ltd.
International Classes:
C03C3/06; C03C15/00; H01L21/22; (IPC1-7): C03C15/00; H01L21/22
Domestic Patent References:
| JP5747744A | ||||
| JP7267679A |
Attorney, Agent or Firm:
Heihachi Hattori