Title:
プラズマ処理システムにおいて酸化イットリウムを含む構造体の一組を洗浄する方法
Document Type and Number:
Japanese Patent JP2007506282
Kind Code:
A
Abstract:
A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.
Inventors:
Shin, Hong
Chen, Anthony, Elle.
Tan, Soku, Kioh
Han, Stefan
John Doughty
Morel, bruno
Chen, Anthony, Elle.
Tan, Soku, Kioh
Han, Stefan
John Doughty
Morel, bruno
Application Number:
JP2006527037A
Publication Date:
March 15, 2007
Filing Date:
September 16, 2004
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/3065; B08B3/00; B08B6/00; B08B7/00; B08B9/00; B44C1/22; C23G1/00; C23G1/02; H01L
Attorney, Agent or Firm:
Takenori Hiroe
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio
Takanobu Takekawa
High Shinichi Ara
Nakamura Shigenori
Tsutomu Nishio