Title:
A negative type photosensitive resin composition, a hardening film, a partition, a black matrix and its manufacturing method, a color filter, and an organic EL device
Document Type and Number:
Japanese Patent JP5910629
Kind Code:
B2
Abstract:
Provided are: a negative photosensitive resin composition which has good ink repellency and good reproducibility of a line width of a mask; and a partition wall which is obtained using the composition and has uniform quality. This negative photosensitive resin is characterized by containing: (A) an ink-repellent agent that has a side chain containing -CFXRf (wherein X represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and Rf represents a fluorine atom or a fluoroalkyl group which may have an ether oxygen atom and has 20 or less carbon atoms, while having at least one hydrogen atom substituted by a fluorine atom) or -(SiR1R2-O)n-SiR3R4R5 (wherein, each of R1, R2, R3 and R4 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, R5 represents a hydrogen atom or an organic group having 1-10 carbon atoms, and n represents an integer of 1-200); (B) a photopolymerization initiator that is an oxime ester compound having a nitro group in each molecule; and (C) an alkali-soluble resin.
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Inventors:
Hideyuki Takahashi
Application Number:
JP2013512314A
Publication Date:
April 27, 2016
Filing Date:
April 19, 2012
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
G03F7/031; G02F1/1335; G02F1/1339; G03F7/004; G03F7/029; G03F7/075; H01L51/50; H05B33/12; H05B33/22
Domestic Patent References:
| JP2010061041A | 2010-03-18 | |||
| JP2010215575A | 2010-09-30 | |||
| JP2011020998A | 2011-02-03 | |||
| JP2011022384A | 2011-02-03 | |||
| JP2011080036A | 2011-04-21 | |||
| JP2008298859A | 2008-12-11 | |||
| JP2009244729A | 2009-10-22 | |||
| JP2010186175A | 2010-08-26 | |||
| JP2011227136A | 2011-11-10 |
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office