Title:
The network architecture and the protocol for the cluster of a lithography machine
Document Type and Number:
Japanese Patent JP5951753
Kind Code:
B2
Abstract:
A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.
Inventors:
Juan Kelvin Cook, Marcel Nikolaas Jacobs
De Bois, Guido
De Bois, Guido
Application Number:
JP2014505664A
Publication Date:
July 13, 2016
Filing Date:
April 23, 2012
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
G03F7/20; H01J37/305; H01L21/027
Domestic Patent References:
| JP2011054679A | ||||
| JP2003532306A | ||||
| JP2011253897A | ||||
| JP2009044131A | ||||
| JP2005175455A | ||||
| JP2004079921A | ||||
| JP2002541657A |
Foreign References:
| WO2010076863A1 | ||||
| WO2010071101A1 | ||||
| WO2001084382A1 |
Attorney, Agent or Firm:
Kurata Masatoshi
Yoshihiro Fukuhara
Nobuhisa Nogawa
Takashi Mine
Katsu Sunagawa
Yoshihiro Fukuhara
Nobuhisa Nogawa
Takashi Mine
Katsu Sunagawa
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