Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/065025
Kind Code:
A1
Abstract:
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming patterns having satisfactory shapes, a resist film, a method for forming a pattern, and a method for producing an electronic device. This actinic-ray-sensitive or radiation-sensitive resin composition comprises a salt including a cation represented by formula (X) and a resin which decomposes by the action of an acid to increase in polarity.
Inventors:
KOJIMA MASAFUMI (JP)
USHIYAMA AINA (JP)
BEKKI YOSUKE (JP)
GOTO AKIYOSHI (JP)
SHIRAKAWA MICHIHIRO (JP)
USHIYAMA AINA (JP)
BEKKI YOSUKE (JP)
GOTO AKIYOSHI (JP)
SHIRAKAWA MICHIHIRO (JP)
Application Number:
PCT/JP2021/032833
Publication Date:
March 31, 2022
Filing Date:
September 07, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F220/54; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2014006491A | 2014-01-16 | |||
| JP2003173023A | 2003-06-20 | |||
| JP2003173022A | 2003-06-20 | |||
| JP2004279576A | 2004-10-07 | |||
| JP2005070329A | 2005-03-17 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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