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Title:
ALD METHOD AND ALD DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/105960
Kind Code:
A1
Abstract:
In this ALD method, a first precursor and a second precursor for performing an ALD cycle are alternately introduced into a reaction chamber (10, 10A, 10B) in an atmospheric-pressure atmosphere, and in the reaction chamber, laminar flow (LP) of the first precursor and laminar flow (LP) of the second precursor are alternately brought into contact with a film-formation target object (P, S1, S2) to form a film on the film-formation target object. Either the laminar flow of the first precursor or the laminar flow of the second precursor is laminar flow of an atmospheric-pressure plasma flow.

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Inventors:
SATO EIJI (JP)
SAKAMOTO HITOSHI (JP)
Application Number:
PCT/JP2023/030873
Publication Date:
May 23, 2024
Filing Date:
August 28, 2023
Export Citation:
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Assignee:
CREATIVE HOLDINGS CO LTD (JP)
International Classes:
C23C16/455; C23C16/50
Foreign References:
JP2010538165A2010-12-09
JP2016020417A2016-02-04
US20060062902A12006-03-23
Attorney, Agent or Firm:
INOUE Hajime et al. (JP)
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