Title:
ARRAY SUBSTRATE AND FABRICATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/184293
Kind Code:
A1
Abstract:
An array substrate, comprising: a substrate (110); a thin film transistor (120) disposed on the substrate (110); a pixel electrode (130) which is disposed on the substrate (110) and which is in contact with the drain of the thin film transistor (120); and a common electrode (140) which is disposed on the pixel electrode (130) and which is electrically insulated from the pixel electrode (130), the common electrode (140) having a plurality of first through holes (141) therein. Further provided is a fabrication method for the array substrate. With the array substrate and the fabrication method therefor, the stray capacitance between the common electrode (140) and the pixel electrode (130) may be reduced, and the release of aggregated ions may be accelerated. By means of forming a three-dimensional electrode structure, the transverse electric field is enhanced so that the driving voltage is reduced, the display penetration rate is increased, and energy consumption is reduced.
Inventors:
CHEN XINGWU (CN)
CHEN LIXUAN (CN)
CHEN LIXUAN (CN)
Application Number:
PCT/CN2017/088379
Publication Date:
October 11, 2018
Filing Date:
June 15, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02F1/1343
Foreign References:
| CN106066559A | 2016-11-02 | |||
| CN106842728A | 2017-06-13 | |||
| CN105404062A | 2016-03-16 | |||
| US20020089631A1 | 2002-07-11 |
Attorney, Agent or Firm:
MING & YUE INTELLECTUAL PROPERTY LAW FIRM (CN)
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