Title:
CHARGED PARTICLE BEAM DEVICE COMPRISING NANOCHIP AND GAS SUPPLY MECHANISM
Document Type and Number:
WIPO Patent Application WO/2015/019665
Kind Code:
A1
Abstract:
Provide is a charged particle beam device comprising a gas field ionization ion source, wherein control of the flow rate (pressure) of a raw material gas is made easier, and without increasing the temperature of the nanochip, the concentration of impurities in the raw material gas is reduced. An intake port for raw material gas and a gas supply mechanism (21) are connected using a small diameter microtube (20), and as a result, in an intake port-side opening of the microtube (20), the flow of the raw material gas becomes an intermediate flow or a viscous flow.
Inventors:
ARAI NORIAKI (JP)
MUTO HIROYUKI (JP)
KAWANAMI YOSHIMI (JP)
MUTO HIROYUKI (JP)
KAWANAMI YOSHIMI (JP)
Application Number:
PCT/JP2014/059921
Publication Date:
February 12, 2015
Filing Date:
April 04, 2014
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J27/26; H01J37/08; H01J37/28
Foreign References:
| JP2013054910A | 2013-03-21 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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