Title:
CHEMICAL AGENT, KIT, PATTERN FORMING METHOD, METHOD FOR PRODUCING CHEMICAL AGENT AND CHEMICAL AGENT CONTAINING BODY
Document Type and Number:
WIPO Patent Application WO/2020/013218
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a chemical agent which exhibits excellent defect suppressing performance even after long-term storage; a kit; a pattern forming method; a method for producing a chemical agent; and a chemical agent containing body. A chemical agent according to the present invention contains an organic solvent, an acid component and a metal component; the content of the acid component is from 1 ppt by mass to 15 ppm by mass (inclusive) relative to the total mass of the chemical agent; and the content of the metal component is from 0.001 ppt by mass to 100 ppt by mass relative to the total mass of the chemical agent.
Inventors:
OOMATSU TADASHI (JP)
KAMIMURA TETSUYA (JP)
SHIMIZU TETSUYA (JP)
TAKAHASHI SATOMI (JP)
OHTSU AKIHIKO (JP)
KAMIMURA TETSUYA (JP)
SHIMIZU TETSUYA (JP)
TAKAHASHI SATOMI (JP)
OHTSU AKIHIKO (JP)
Application Number:
PCT/JP2019/027289
Publication Date:
January 16, 2020
Filing Date:
July 10, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/16; C11D7/24; C11D7/26; C11D7/50; G03F7/32; H01L21/304
Domestic Patent References:
| WO2017188296A1 | 2017-11-02 | |||
| WO2018061573A1 | 2018-04-05 | |||
| WO2018092763A1 | 2018-05-24 | |||
| WO2004093172A1 | 2004-10-28 |
Foreign References:
| US20140263053A1 | 2014-09-18 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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