Title:
CLEAN METHOD AND APPARATUS FOR VACUUM HOLDING OF SUBSTRATES
Document Type and Number:
WIPO Patent Application WO2003007346
Kind Code:
A3
Abstract:
A system for preventing contaminants and particulates from coming into contact with a back side of a workpiece as the workpiece is vacuum held on a chuck or robotic end effector.
Inventors:
KROLAK MICHAEL
Application Number:
PCT/US2002/021828
Publication Date:
December 18, 2003
Filing Date:
July 10, 2002
Export Citation:
Assignee:
ASYST TECHNOLOGIES (US)
International Classes:
H01L21/677; H01L21/687; H01L21/00; (IPC1-7): H01L21/00
Domestic Patent References:
| WO1999033725A1 | 1999-07-08 |
Foreign References:
| US6068316A | 2000-05-30 | |||
| US5080549A | 1992-01-14 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 017, no. 064 (M - 1364) 8 February 1993 (1993-02-08)
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 11 29 November 1996 (1996-11-29)
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 11 29 November 1996 (1996-11-29)
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