Title:
COMPOSITION FOR UNDERLAYER FILM FORMATION, UNDERLAYER FILM, AND LITHOGRAPHY PROCESS
Document Type and Number:
WIPO Patent Application WO/2022/039082
Kind Code:
A1
Abstract:
The present invention provides a composition for underlayer film formation having excellent alignment orientation of phase-separated structures as achieved via self-organization, an underlayer film of a self-organizing film, and a self-organized lithography process. A composition for underlayer film formation of a self-organized film in a self-organized lithography process, wherein the composition for underlayer film formation contains a solvent and a polymer (1) having a partial structure represented by formula (1). (In formula (1), X is a hydrogen atom, a halogen atom, a hydroxyl group, a C1-5 alkyl group, a C1-5 hydroxyalkyl group, or a C1-5 halogenated alkyl group, etc.)
Inventors:
TAMADA MIKI (JP)
KUMEGAWA RYO (JP)
SHIRATANI MOTOHIRO (JP)
KOMATSU HIROYUKI (JP)
MARUYAMA KEN (JP)
OSAWA SOSUKE (JP)
KUMEGAWA RYO (JP)
SHIRATANI MOTOHIRO (JP)
KOMATSU HIROYUKI (JP)
MARUYAMA KEN (JP)
OSAWA SOSUKE (JP)
Application Number:
PCT/JP2021/029616
Publication Date:
February 24, 2022
Filing Date:
August 11, 2021
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F8/00; C08F120/10; H01L21/027
Domestic Patent References:
| WO2005013601A1 | 2005-02-10 |
Foreign References:
| JP2012061531A | 2012-03-29 | |||
| JP2012062365A | 2012-03-29 | |||
| JP2010237491A | 2010-10-21 | |||
| JP2010113035A | 2010-05-20 | |||
| JP2008036491A | 2008-02-21 | |||
| JP2016117865A | 2016-06-30 | |||
| JP2018538382A | 2018-12-27 | |||
| US20140193614A1 | 2014-07-10 | |||
| JP2016161886A | 2016-09-05 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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