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Patent Searching and Data


Title:
ELECTRON BEAM MICROSCOPE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2014/069325
Kind Code:
A1
Abstract:
This electron beam microscope apparatus is provided with: a vacuum-exhaustible mirror body; an electron gun for generating an electron beam; an electromagnetic lens for focusing the electron beam; a first sample holder for mounting a first sample; a first stage having a first airlock mechanism in which the first sample holder can be introduced inside the mirror body without releasing the air from the mirror body; and a detector for detecting a signal originating as the result of the mutual action of the electron beam and the first sample. The mirror body is provided with an opening part provided with a second airlock mechanism roughly in the same plane as the first sample mounted in the first sample holder, the second airlock mechanism being configured so that a prescribed member can be introduced inside the mirror body without releasing the air from the mirror body.

Inventors:
KIKUCHI HIDEKI (JP)
TAMURA KEIJI (JP)
UEDA KOTA (JP)
SAITOU KOUICHIROU (JP)
NAMEKAWA RYOJI (JP)
INADA HIROMI (JP)
Application Number:
PCT/JP2013/078807
Publication Date:
May 08, 2014
Filing Date:
October 24, 2013
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/18; H01J37/09; H01J37/16; H01J37/20; H01J37/244
Foreign References:
JPS5420657A1979-02-16
JPH04306547A1992-10-29
JPS6215763U1987-01-30
JP2011034744A2011-02-17
JP2002141382A2002-05-17
JPH04286843A1992-10-12
Attorney, Agent or Firm:
HIRAKI Yusuke et al. (JP)
Yusuke Hiraki (JP)
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