Title:
GAS NOZZLE, METHOD FOR PRODUCING GAS NOZZLE, AND PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/110964
Kind Code:
A1
Abstract:
A gas nozzle of the present disclosure comprises a tube-shaped feed hole for guiding a gas and a spray hole connected to the feed hole. The gas nozzle is for spraying the gas from the spray hole and is formed from a single crystal or a ceramic whose primary component is: a rare earth element oxide; fluoride or acid fluoride; or an yttrium aluminum compound oxide. The arithmetic mean roughness Ra of the inner circumferential surface forming the feed hole is smaller on the gas outflow side than on the inflow side.
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Inventors:
NOGUCHI YUKIO (JP)
SAHASHI TOMOYA (JP)
SAHASHI TOMOYA (JP)
Application Number:
PCT/JP2019/045873
Publication Date:
June 04, 2020
Filing Date:
November 22, 2019
Export Citation:
Assignee:
KYOCERA CORP (JP)
International Classes:
B24B31/00; B05B15/18; C04B35/50; H01L21/3065; H01L21/31
Domestic Patent References:
| WO2014119177A1 | 2014-08-07 | |||
| WO2017073679A1 | 2017-05-04 | |||
| WO2013065666A1 | 2013-05-10 |
Foreign References:
| JP2005286069A | 2005-10-13 | |||
| JP2017091779A | 2017-05-25 | |||
| JP2008222979A | 2008-09-25 | |||
| JP2013049096A | 2013-03-14 | |||
| JPH0219468A | 1990-01-23 | |||
| JP2010059520A | 2010-03-18 | |||
| JP2007063595A | 2007-03-15 |
Other References:
See also references of EP 3888848A4
Attorney, Agent or Firm:
BUNA PATENT ATTORNEYS (JP)
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