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Title:
MASK USED FOR VACUUM VAPOR DEPOSITION, VAPOR DEPOSITION METHOD, DISPLAY APPARATUS, AND VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/113852
Kind Code:
A1
Abstract:
Provided are a mask used for vacuum vapor deposition, a method for using a mask to perform vapor deposition, an organic light-emitting display apparatus, and a device for using a mask to perform vapor deposition. The mask comprises: a substrate (100); a reflective layer (200), said reflective layer (200) being arranged on the substrate (100) and the reflective layer (200) having a hollow region; a heat-absorbing layer (300); said heat-absorbing layer (300) is arranged on the substrate (100) side having the reflective layer (200) and covers the hollow region.

Inventors:
LIAO ZHIFU (CN)
Application Number:
PCT/CN2017/116005
Publication Date:
June 20, 2019
Filing Date:
December 13, 2017
Export Citation:
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Assignee:
SHENZHEN ROYOLE TECHNOLOGIES CO LTD (CN)
International Classes:
H01L51/56; C23C14/04
Foreign References:
CN104934370A2015-09-23
CN106876612A2017-06-20
CN103695842A2014-04-02
CN106521412A2017-03-22
CN106591776A2017-04-26
US20100015424A12010-01-21
US20090104403A12009-04-23
Attorney, Agent or Firm:
TSINGYIHUA INTELLECTUAL PROPERTY LLC (CN)
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