MEASURING METHOD, MEASURING EQUIPMENT, EXPOSING METHOD AND EXPOSING EQUIPMENT

Title:

MEASURING METHOD, MEASURING EQUIPMENT, EXPOSING METHOD AND EXPOSING EQUIPMENT

Document Type and Number:

WIPO Patent Application WO/2005/104196

Kind Code:

A1

Abstract:

[PROBLEMS] To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. [MEANS FOR SOLVING PROBLEMS] In an alignment sensor of exposing equipment, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for instance, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline quantity is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and &sgr of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.

Inventors:

KOBAYASHI MITSURU (JP)
YASUDA MASAHIKO (JP)

Application Number:

PCT/JP2005/007507

Publication Date:

November 03, 2005

Filing Date:

April 20, 2005

Export Citation:

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Assignee:

NIKON CORP (JP)
KOBAYASHI MITSURU (JP)
YASUDA MASAHIKO (JP)

International Classes:

G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F9/00

Domestic Patent References:

WO1999034416A1

1999-07-08

Foreign References:

JP2002170770A	2002-06-14
JP2591746B2	1997-03-19
JP2000323394A	2000-11-24
JP2002198291A	2002-07-12
JP2002170757A	2002-06-14
JPH09134863A	1997-05-20
US20020034831A1	2002-03-21
EP1043761A1	2000-10-11
US6416912B1	2002-07-09

Other References: