Title:
METHOD AND APPARATUS FOR ADJUSTING PROCESS CONTROL PREDICTION MODEL, AND PROCESS CONTROLLER
Document Type and Number:
WIPO Patent Application WO/2020/010629
Kind Code:
A1
Abstract:
Disclosed is a method for adjusting a process control prediction model. The method comprises: determining, based on controlled variable data in process control data obtained through real-time monitoring, whether the prediction performance of a process control prediction model is lower than a reference performance; and using, when the prediction performance is determined to be lower than the reference performance, operating variable data in the monitored process control data to adjust the process control prediction model. By means of the method, a re-test does not need to be executed to re-recognize a model so as to eliminate a mismatch of the process control prediction model, thereby eliminating the influence of fluctuation introduced by the addition of an excitation signal during the re-test.
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Inventors:
WEN BO (CN)
NIU ZHU (CN)
FAN SHUNJIE (CN)
NIU ZHU (CN)
FAN SHUNJIE (CN)
Application Number:
PCT/CN2018/095685
Publication Date:
January 16, 2020
Filing Date:
July 13, 2018
Export Citation:
Assignee:
SIEMENS AG (DE)
WEN BO (CN)
NIU ZHU (CN)
FAN SHUNJIE (CN)
WEN BO (CN)
NIU ZHU (CN)
FAN SHUNJIE (CN)
International Classes:
G05B13/04
Foreign References:
| CN105700358A | 2016-06-22 | |||
| CN101587328A | 2009-11-25 | |||
| CN101349893A | 2009-01-21 | |||
| CN104793489A | 2015-07-22 |
Attorney, Agent or Firm:
KANGXIN PARTNERS, P.C. (CN)
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