METHOD OF CLEANING, AND PROCESS FOR PRODUCING, GLASS SUBSTRATE, AND MAGNETIC DISK UTILIZING THE SAME

Title:

METHOD OF CLEANING, AND PROCESS FOR PRODUCING, GLASS SUBSTRATE, AND MAGNETIC DISK UTILIZING THE SAME

Document Type and Number:

WIPO Patent Application WO/2008/004469

Kind Code:

A1

Abstract:

A method of cleaning glass substrate (G) composed mainly of SiO2, in which without complication of cleaning operation, any sticking abrasives and foreign matter can be removed with certainty after polishing operation. The method is characterized by scrub cleaning thereof using a liquid exhibiting a rate of Si element elution ranging from 1 to 5000 ppb/mm2 as cleaning fluid (3).

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Inventors:

KAWAI HIDEKI (JP)
NAKATSUJI YUKITOSHI (JP)
SAWADA HIROAKI (JP)
SAEKI SHINICHI (JP)

Application Number:

PCT/JP2007/062865

Publication Date:

January 10, 2008

Filing Date:

June 27, 2007

Export Citation:

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Assignee:

KONICA MINOLTA OPTO INC (JP)
KAWAI HIDEKI (JP)
NAKATSUJI YUKITOSHI (JP)
SAWADA HIROAKI (JP)
SAEKI SHINICHI (JP)

International Classes:

B08B3/08; B08B7/04; G11B5/73; G11B5/84

Foreign References:

JP2000140778A	2000-05-23
JP2000132829A	2000-05-12

Attorney, Agent or Firm:

SANO, Shizuo (2-6 Tenmabashi-Kyomachi, Chuo-K, Osaka-Shi Osaka 32, JP)

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