Title:
PROCESS FOR PRODUCING GLASS SUBSTRATE, MAGNETIC DISC AND PROCESS FOR MANUFACTURING THE SAME
Document Type and Number:
WIPO Patent Application WO/2008/004471
Kind Code:
A1
Abstract:
A process for producing a glass substrate composed mainly of SiO2 having
its surface provided with a uniform microscopic streak pattern by ultraprecision
polishing processing, which process includes the step of with respect to the
polished glass substrate, inspecting whether a certain property of bound energy
as to 2P-orbit occupying electrons of Si atom at an outermost surface portion
thereof as determined by XPS is a certain specified value or below, the above certain
property being an extent of shift of the bound energy or a half-value width of bound
energy distribution, the above specified value being 0.10 eV or 2.15 eV, respectively.
Inventors:
KAWAI HIDEKI (JP)
Application Number:
PCT/JP2007/062867
Publication Date:
January 10, 2008
Filing Date:
June 27, 2007
Export Citation:
Assignee:
KONICA MINOLTA OPTO INC (JP)
KAWAI HIDEKI (JP)
KAWAI HIDEKI (JP)
International Classes:
C03C19/00; G11B5/73
Foreign References:
| JP2001312817A | 2001-11-09 | |||
| JP2001027623A | 2001-01-30 | |||
| JP2001281180A | 2001-10-10 |
Attorney, Agent or Firm:
SANO, Shizuo (2-6 Tenmabashi-Kyomachi, Chuo-K, Osaka-Shi Osaka 32, JP)
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