Title:
METHOD OF CLEANING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2005/104202
Kind Code:
A1
Abstract:
With respect to the jet washing of a large thin substrate, such as a semiconductor substrate or a glass substrate, there is provided a cleaning method of high cleaning effect without damaging the substrate. Pure water (3) is added to an aqueous solution of isopropyl alcohol (IPA), in particular, solid liquid mixture (4a) consisting of ice (5) and a water-IPA solution so that the IPA concentration based on the whole mixture is regulated to realize an enhanced jettability. Consequently, cleaning can be performed without using of any carrier gas. Alternatively, an IPA solution is added in place of the pure water (3) so that similarly an enhanced jettability is realized and further so that the freezing point thereof is regulated to enable regulation of the amount of ice formed.
Inventors:
TAKAGI MIKIO (JP)
Application Number:
PCT/JP2005/007629
Publication Date:
November 03, 2005
Filing Date:
April 21, 2005
Export Citation:
Assignee:
F T L CO LTD (JP)
TAKAGI MIKIO (JP)
TAKAGI MIKIO (JP)
International Classes:
B08B3/02; B08B7/00; C03C23/00; H01L21/02; H01L21/304; (IPC1-7): H01L21/304; B08B7/00
Foreign References:
| JPH08294680A | 1996-11-12 | |||
| JP3380021B2 | 2003-02-24 | |||
| JPH0479326A | 1992-03-12 |
Attorney, Agent or Firm:
Murai, Takuo (Fines Bld. Minatomirai 20, Kaigandori 4-chome, Naka-k, Yokohama Kanagawa, JP)
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