Title:
METHOD OF MANUFACTURING AN ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO2004102279
Kind Code:
A3
Abstract:
A method of manufacturing an electronic device is provided wherein an interconnect is made using 193 nm lithography. No deformation of the desired linewidth takes place in that during a plasma gas is used which dissociates in low-weight ions. The electronic device is particularly an integrated circuit.
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Inventors:
FURUKAWA YUKIKO (BE)
WOLTERS ROBERTUS A M (NL)
WOLTERS ROBERTUS A M (NL)
Application Number:
PCT/IB2004/050664
Publication Date:
January 20, 2005
Filing Date:
May 12, 2004
Export Citation:
Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
FURUKAWA YUKIKO (BE)
WOLTERS ROBERTUS A M (NL)
FURUKAWA YUKIKO (BE)
WOLTERS ROBERTUS A M (NL)
International Classes:
G03F7/36; G03F7/40; H01L21/311; H01L21/768; (IPC1-7): G03F7/40; H01L21/768
Foreign References:
US6183940B1 | 2001-02-06 | |||
US6103457A | 2000-08-15 |
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