Title:
COMPUTER-IMPLEMENTED METHOD AND CARRIER MEDIUM CONFIGURED TO GENERATE A SET OF PROCESS PARAMETERS AND/OR A LIST OF POTENTIAL CAUSES OF DEVIATIONS FOR A LITHOGRAPHY PROCESS
Document Type and Number:
WIPO Patent Application WO2004102278
Kind Code:
B1
Abstract:
A computer-implemented method and a carrier medium adapted to improve lithographic processes are provided. In some embodiments, the computer-implemented method and carrier medium may be used for identifying potential causes of lithography process failure or drift. In addition or alternatively, the computer-implemented method and carrier medium may be adapted to generate a set of process parameter values for a lithography process based upon both critical dimension and overlay effect analyses of process parameter value variations. In some cases, the set of process parameter values may be selected to collectively minimize the number critical dimension and overlay variation errors produced within an image fabricated from the lithography process.
Inventors:
MACK CHRIS (US)
JONES ROBERT (US)
BYERS JEFFREY (US)
JONES ROBERT (US)
BYERS JEFFREY (US)
Application Number:
PCT/US2004/014212
Publication Date:
September 01, 2005
Filing Date:
May 07, 2004
Export Citation:
Assignee:
KLA TENCOR TECH CORP (US)
MACK CHRIS (US)
JONES ROBERT (US)
BYERS JEFFREY (US)
MACK CHRIS (US)
JONES ROBERT (US)
BYERS JEFFREY (US)
International Classes:
G03F7/20; (IPC1-7): G03F7/20; G06F19/00; H01L21/00
Download PDF:
Previous Patent: METHOD PROVIDING AN IMPROVED BI-LAYER PHOTORESIST PATTERN
Next Patent: METHOD OF MANUFACTURING AN ELECTRONIC DEVICE
Next Patent: METHOD OF MANUFACTURING AN ELECTRONIC DEVICE