OXIDE MATERIAL AND SPUTTERING TARGET

Title:

OXIDE MATERIAL AND SPUTTERING TARGET

Document Type and Number:

WIPO Patent Application WO/2007/034749

Kind Code:

A1

Abstract:

Provided are an oxide material characterized in that indium (In), tin (Sn) and a metal element (M) are included, and furthermore, an ilmenite structure compound is included; a sputtering target composed of such oxide material; a transparent conducting film formed by using such sputtering target; and a transparent electrode composed of such transparent conducting film.

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Inventors:

YANO KOKI (JP)
INOUE KAZUYOSHI (JP)
TANAKA NOBUO (JP)

Application Number:

PCT/JP2006/318391

Publication Date:

March 29, 2007

Filing Date:

September 15, 2006

Export Citation:

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Assignee:

IDEMITSU KOSAN CO (JP)
YANO KOKI (JP)
INOUE KAZUYOSHI (JP)
TANAKA NOBUO (JP)

International Classes:

C04B35/00; C23C14/34

Foreign References:

JP2000256061A	2000-09-19
JPH0570943A	1993-03-23
JPH06318406A	1994-11-15
JP2001155549A	2001-06-08

Attorney, Agent or Firm:

WATANABE, Kihei (26 Kanda Suda-cho 1-chome, Chiyoda-k, Tokyo 41, JP)

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