Title:
PHOTOCURABLE RESIN COMPOSITION CONTAINING ANTHRAQUINONE DERIVATIVE
Document Type and Number:
WIPO Patent Application WO/2007/074782
Kind Code:
A1
Abstract:
Disclosed is a photocurable resin composition which is highly sensitive to ultraviolet light
or visible light having a long wavelength, in particular a photocurable resin
composition which is useful as a sealing agent. Specifically disclosed is a photocurable
resin composition containing a component (a) which is composed of an anthraquinone
derivative represented by the formula (I) below, and a component (b) which is
composed of a compound having a (meth)acryloyl group in a molecule. The photocurable
resin composition is characterized in that a part or the entire of the component
(b) further contains an oxiranyl group in a molecule, and the component (a) content
is 0.01-10% by mass relative to the component (b) content. [chemical formula
1] (I) (In the formula (I), X represents a phenyl group, an alkyl group having 1-8
carbon atoms, an alcoholic form of the phenyl group or the alkyl group, or a derivative
of the alcoholic form.)
Inventors:
TAKEUCHI FUMITO
MIZUTA YASUSHI
MIZUTA YASUSHI
Application Number:
PCT/JP2006/325798
Publication Date:
July 05, 2007
Filing Date:
December 25, 2006
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
TAKEUCHI FUMITO
MIZUTA YASUSHI
TAKEUCHI FUMITO
MIZUTA YASUSHI
International Classes:
C08F220/38; C07C323/22; G02F1/1339
Domestic Patent References:
| WO2004041900A1 | 2004-05-21 |
Foreign References:
| JPS53142490A | 1978-12-12 |
Attorney, Agent or Firm:
WASHIDA, Kimihito (Shintoshicenter Bldg. 24-1, Tsurumaki 1-chom, Tama-shi Tokyo 34, JP)
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