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Title:
PLASMA EXPOSURE METHOD AND PLASMA EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2017/056184
Kind Code:
A1
Abstract:
This plasma exposure system 10 is provided with a spray nozzle 78 for spraying a heated inert gas, exposure nozzle 54 for plasma exposure, and a spray nozzle 84 for spraying a cooled inert gas. Furthermore, an article 90 to be treated, which has been heated by the heated gas, is exposed to plasma. Furthermore, the article to be treated that has been exposed to the plasma is cooled by spraying the cooled gas on the article to be treated. Thus, it is possible to efficiently carry out plasma treatment by plasma exposure of the high temperature article to be treated. In addition, after plasma treatment, the article to be treated is cooled rapidly; therefore, it is possible to appropriately prevent effects of oxidation and the like on the article to be treated in a high temperature state. Furthermore, by spraying the article to be treated with an inert gas, the surroundings of the article to be treated are filled with the inert gas and virtually no active gas is present; therefore, it is possible to suitably prevent the effects of active gasses on the article to be treated.

Inventors:
JINDO TAKAHIRO (JP)
IKEDO TOSHIYUKI (JP)
NIWA AKIHIRO (JP)
Application Number:
PCT/JP2015/077496
Publication Date:
April 06, 2017
Filing Date:
September 29, 2015
Export Citation:
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Assignee:
FUJI MACHINE MFG (JP)
International Classes:
B01J19/08; H05H1/24; H05H1/26
Domestic Patent References:
WO2014184910A12014-11-20
Foreign References:
JP2010129198A2010-06-10
JP2010126734A2010-06-10
JP2014060035A2014-04-03
Attorney, Agent or Firm:
NEXT INTERNATIONAL et al. (JP)
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