Title:
PLASMA PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/051248
Kind Code:
A1
Abstract:
[Problem] To reliably prevent abnormal electrical discharges near an inlet of a gas passage when the gas passage is provided to a dielectric window through which electromagnetic waves for plasma generation are introduced after being transmitted inside a chamber. [Solution] This microwave plasma processing apparatus has, as a gas introduction mechanism for introducing a working gas inside a chamber (10), electrical discharge prevention members(96(1) to 96(8)), each of which is provided to a plurality of dielectric window gas passages (94(1) to (94(8)) through which a dielectric window (54) passes. Each electrical discharge prevention member (96(n)), a portion (114) of which protrudes only a height h, which is greater than or equal to a predetermined distance H, upward from the rear surface of a dielectric window (52) on the inlet side, passes through an opening (54a) of a slot plate (54), and inserts into a branched gas passage (92(n)) of a gas branch part (90). The gas branch part (90), spring coils (116) and the slot plate (54), which surround the protruding portion (114) of each electrical discharge prevention member (96(n)), constitute an enclosing conductor (118).
Inventors:
ISHIBASHI KIYOTAKA (JP)
MORITA OSAMU (JP)
MORITA OSAMU (JP)
Application Number:
PCT/JP2012/006331
Publication Date:
April 11, 2013
Filing Date:
October 03, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H05H1/46; C23C16/511; H01L21/3065; H01L21/31
Foreign References:
| JP2007221116A | 2007-08-30 |
Attorney, Agent or Firm:
SASAKI, Seikoh (JP)
Kiyotaka Sasaki (JP)
Kiyotaka Sasaki (JP)
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Claims: