POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE

WIPO Patent Application WO/2010/053096

A1

Disclosed is a polishing liquid composition for a magnetic disk substrate that can reduce scratches and surface roughness of the substrate after polishing without sacrificing productivity.  Also disclosed is a method for manufacturing a magnetic disk substrate using the polishing liquid composition.  The polishing liquid composition comprises a colloidal silica having a ΔCV value of 0 to 10% and water.  The ΔCV value is defined by equation ΔCV = CV30 - CV90 wherein CV30 represents a value obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 30° by a dynamic light scattering method by the average particle diameter based on the scattering intensity distribution and multiplying the obtained value by 100; and CV90 represents a value obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 90°by the average particle diameter based on the scattering intensity distribution and multiplying the obtained value by 100.

OSHIMA YOSHIAKI
HAMAGUCHI TAKESHI
SATO KANJI
YAMAGUCHI NORIHITO
DOI HARUHIKO

PCT/JP2009/068837

May 14, 2010

November 04, 2009

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KAO CORP (JP)
OSHIMA YOSHIAKI
HAMAGUCHI TAKESHI
SATO KANJI
YAMAGUCHI NORIHITO
DOI HARUHIKO

C09K3/14; B24B37/04; G11B5/84; C03C19/00

WO2008123373A1	2008-10-16
WO2008018434A1	2008-02-14

JP2008179763A	2008-08-07
JP2006071497A	2006-03-16
JP2008137822A	2008-06-19

IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)

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